- Purity: ≥99.5%
- Moisture: ≤0.05%
- Air Content: ≤0.2%
- Acidity (as HF): ≤0.1%
- Non-condensable Gas: ≤0.1%
Applications
Silicon tetrafluoride is an important inorganic fluorine silicon raw material widely used in electronic semiconductor industry for chemical vapor deposition, epitaxial growth and ion implantation process as silicon source and fluorine etching gas. It is the key raw material for the production of electronic grade high-purity silica, fluorosilicic acid and fluorosilicate salts. In chemical industry, it is used for manufacturing refrigerant additives, organic fluorine silicon compounds and fine fluorine chemicals. It also serves as a raw material for optical fiber preform production, ceramic glaze modifier and pharmaceutical fluorine-containing intermediate synthesis, with irreplaceable application value in semiconductor manufacturing, new material preparation and fine chemical fields.
Safety Information
This gas is highly irritating and corrosive, severely irritating and corrosive to respiratory tract, skin and eyes. It hydrolyzes immediately when meeting moisture to generate toxic and corrosive hydrofluoric acid, which can cause severe burns and tissue necrosis. Inhalation may lead to cough, chest tightness, pulmonary edema and even life-threatening poisoning symptoms. Avoid leakage inhalation, skin and eye contact strictly. Operation must be carried out in well-ventilated special gas operation area with gas mask, chemical protective clothing, acid-proof gloves and goggles. Keep away from water source, strong alkali and active metals; strictly prevent cylinder collision and leakage. Waste gas must be treated by alkali absorption, and shall not be directly discharged to avoid air and environmental pollution.
